专利名称：Projection arrangement发明人：Rolf Freimann,Boris Bittner申请号：US14086393申请日：20131121公开号：US09377694B2公开日：20160628
专利附图：
摘要：A projection arrangement for imaging lithographic structure informationcomprises: an optical element, which has at least partly a coating composed of anelectrically conductive layer material. The coating comprises a continuous region, whichhas no elements that shade projection light. In this case, the layer material and/or the
optical element change(s) an optical property, in particular a refractive index or an opticalpath length, depending on a temperature change. At least one mechanism for couplingenergy into the layer material is provided, which couples in energy in such a way that thelayer material converts coupled-in energy into thermal energy. The layer material maycomprise graphene, chromium and/or molybdenum sulfide (MoS2).
申请人：Carl Zeiss SMT GmbH
地址：Oberkochen DE
国籍：DE
代理机构：Fish & Richardson P.C.
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